Electron Beam Sources

Electron beam or e-beam are streams of electrons observed in vacuum tubes, i.e. evacuated glass tubes that are equipped with at least two metal electrodes to which a voltage is applied, a cathode or negative electrode and an anode or positive electrode.

Equipment

U-eLektron Ebeam System from USHIO America

The U-eLektron Ebeam system was designed to provide a research and development oriented solution to labs of any size. As a bench top tool, the U-eLektron can provide immediate results without the cost or time required for external testing.

JEBG Series High-Power Electron Beam Sources from JEOL

JEBG Series / High Power Electron Beam Sources are designed to uniformly deposit metal oxides onto wide plastic films or steel plates in a continuous feed such as in magnetic tape manufacture for high-density recording or in wrapping-film manufacture with an oxide barrier function. Electron beam sources are also used for depositing of MgO film on plasma display panels and for development of surface-treated steel plates. Electron beam sources are also used for the melting of high-melting-point materials and high-purity metals.

Model 295 Large Capacity Multi-Pocket E-Beam Sources from Telemark

For applications requiring large evaporation materials inventory (e.g. multiple or thick layers, extended throw distances) the Model 295 Source provides a wide range of crucible sizes including 6x100cc, 16x15cc, 10x40cc, and a 1486cc trough. Available in 10Kw or 15Kw versions, with Arc-Suppression available as an option.

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