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Welcome
The Surface and Nanostructure Metrology Group establishes best-in-the-world SI-traceable length metrology for 3D nanostructures using high-throughput, non-destructive measurement methods with rigorous nanoscale reference metrology. We work closely with leading U.S. semiconductor manufacturers, nanoelectronics, and metrology tool manufacturers to provide new measurement solutions for critical defect and dimensional metrology needs. We develop the fundamental measurement science and data analysis methods in support of government and U.S. manufacturing where surface roughness, form, and nano-structure topography are critical. Activities include:
 Programs/Projects
Optical Methods for 3-D Nanostructure Metrology—We develop new approaches to optical microscopy and electromagnetic modeling to enable improved metrology of nanoscale structures with dimensions more than an order of magnitude below traditional … Forensic Topography and Surface Metrology—We seek to build the scientific infrastructure for objective forensic firearm and toolmark identification by developing rigorous procedures to obtain quantitative uncertainty estimates for forensic … Atom-Based Dimensional Metrology—To fabricate and measure solid state implementations of manufacturable atomically precise devices. Build the infrastructure to fabricate prototype few-atom structures in isotopically pure Si and … Traceable Scanning Probe Nano-Characterization—Research and development of rigorously SI traceable nano-characterization instrumentation, measurements, and procedures to enable a fundamental understanding of scanning probe interaction and … Nano-Structured Optics and Optical Surface Metrology—The project focuses on significant metrology challenges that impede the advancement of high-performance optical and photonic systems. We develop, fabricate, and characterize innovative … |
Highlights
Contact
Physical Measurement Laboratory (PML) |
