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[1702.04991v1] Preparing local strain patterns in graphene by atomic force microscope based indentation
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Condensed Matter > Mesoscale and Nanoscale Physics

arXiv:1702.04991v1 (cond-mat)
[Submitted on 16 Feb 2017 (this version), latest version 8 Jun 2017 (v2)]

Title:Preparing local strain patterns in graphene by atomic force microscope based indentation

Authors:Péter Nemes-Incze, Gergő Kukucska, János Koltai, Jenő Kürti, Chanyong Hwang, Levente Tapasztó, László P. Biró
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Abstract:Patterning graphene into various mesoscopic devices such as nanoribbons, quantum dots, etc. by lithographic techniques has enabled the guiding and manipulation of graphene's Dirac-type charge carriers. Graphene, with well-defined strain patterns, holds promise of similarly rich physics while avoiding the problems created by the hard to control edge configuration of lithographically prepared devices. To engineer the properties of graphene via mechanical deformation, versatile new techniques are needed to pattern strain profiles in a controlled manner. Here we present a process by which strain can be created in substrate supported graphene layers. Our atomic force microscope-based technique opens up new possibilities in tailoring the properties of graphene using mechanical strain.
Subjects: Mesoscale and Nanoscale Physics (cond-mat.mes-hall)
Cite as: arXiv:1702.04991 [cond-mat.mes-hall]
  (or arXiv:1702.04991v1 [cond-mat.mes-hall] for this version)
  https://doi.org/10.48550/arXiv.1702.04991

Submission history

From: Peter Nemes-Incze [view email]
[v1] Thu, 16 Feb 2017 14:42:08 UTC (4,193 KB)
[v2] Thu, 8 Jun 2017 14:07:16 UTC (1,538 KB)
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