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[1906.04850] Defect-Moderated Oxidative Etching of MoS2
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Condensed Matter > Materials Science

arXiv:1906.04850 (cond-mat)
[Submitted on 11 Jun 2019]

Title:Defect-Moderated Oxidative Etching of MoS2

Authors:Pierce Maguire, Jakub Jadwiszczak, Maria O'Brien, Darragh Keane, Georg S. Duesberg, Niall McEvoy, Hongzhou Zhang
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Abstract:We report a simple technique for the selective etching of bilayer and monolayer MoS$_2$. In this work, chosen regions of MoS$_2$ were activated for oxygen adsorption and reaction by the application of low doses of He$^+$ at 30 keV in a gas ion microscope. Raman spectroscopy, optical microscopy and scanning electron microscopy were used to characterize both the etched features and the remaining material. It has been found that by using a pre-treatment to introduce defects, MoS$_2$ can be etched very efficiently and with high region specificity by heating in air.
Comments: 8 pages, 6 figures
Subjects: Materials Science (cond-mat.mtrl-sci)
Cite as: arXiv:1906.04850 [cond-mat.mtrl-sci]
  (or arXiv:1906.04850v1 [cond-mat.mtrl-sci] for this version)
  https://doi.org/10.48550/arXiv.1906.04850
Related DOI: https://doi.org/10.1063/1.5115036

Submission history

From: Pierce Maguire [view email]
[v1] Tue, 11 Jun 2019 22:40:35 UTC (2,880 KB)
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