三甲 基 硅烷
| |||
识别 | |||
CAS |
993-07-7 | ||
ChemSpider | 63614 | ||
SMILES |
| ||
C3H10Si | |||
74.2 g·mol−1 | |||
0.638 g cm-3 | |||
熔点 | -135.9 °C(137 K) | ||
6.7 °C(280 K) | |||
危险 | |||
警示术语 | R:R12, R36/37/38 | ||
S:S9, S16, S26, S33 | |||
F | |||
NFPA 704 | |||
参 见
[编辑]参考 资料
[编辑]- ^ Chen, Sheng-Wen; Wang, Yu-Sheng; Hu, Shao-Yu; Lee, Wen-Hsi; Chi, Chieh-Cheng; Wang, Ying-Lang. A Study of Trimethylsilane (3MS) and Tetramethylsilane (4MS) Based
α -SiCN:H/α -SiCO:H Diffusion Barrier Films. Materials. 2012, 5 (3): 377. doi:10.3390/ma5030377.
这是 |